Analyses and Modeling of a Wet-Chemical-Etch Process on Rotating Silicon Wafers with an Impinging Etchant Jet

Suchergebnisse

• Abgeschlossen

  Advanced Process Control (APC) for Semiconductor Processing Equipment (II)

  Hofbaur, M., Staudegger, F. & Dourdoumas, N.

  1/08/05 → 31/07/07

  Projekt: Forschungsprojekt