TY - CONF
T1 - Additive, Direct-Write Fabrication of Plasmonic Nano-Antennas: a 3D Nanoprinting Approach
AU - Kuhness, David
AU - Gruber, Alexander
AU - Fitzek, Harald Matthias
AU - Winkler, Robert
AU - Letofsky-Papst, Ilse
AU - Kothleitner, Gerald
AU - Plank, Harald
PY - 2021/9/13
Y1 - 2021/9/13
N2 - While the general interest in nano-plasmonics is still unbroken, there is an increasing trend towards the integration in real applications such as direct nano-emitters or high performance sensors [1]. Aside of novel concepts, versatile fabrication methods are in demand, which provide a high degree of flexibility concerning design and manufacturing possibilities. Although traditional methods, such as e-beam lithography, are very powerful, well established and reliable, they are often limited in their applicability (e.g. flat surfaces). In contrast, additive direct-write manufacturing may overcome such limitations, although techniques for reliable sub-100 nm fabrication are only a few [2]. In that respect, focused electron beam induced deposition (FEBID) is one of the promising candidates, which not only meets resolution requirements, but also allows true 3D nano-printing on a broad range of materials and almost any surface morphology [3]. As FEBID materials notoriously suffer from high carbon contents, chemical post-growth transfer into pure materials is indispensably needed, which can severely harm or even destroy FEBID-based 3D nano-architectures. Following that challenge, we have dissected FEBID growth characteristics and combined individual advantages via advanced patterning approaches. That allows direct-write fabrication of high-fidelity shapes with nanoscale features in the sub-10 nm range, which allow a shape-stable chemical transfer into plasmonically active Au nano-antennas. Consequently, this contribution ranges from initial 3D-FEBID fabrication over purification towards confirmation of the originally intended plasmonic functionality [4]. The latter is compared to theoretical modelling, which reveals very good agreement and underlines the reliability of 3D-FEBID as generic approach towards more complex 3D nano-concepts for future applications. [1] Plank et al., Micromachines, 11, 1 (2020)[2] Hirt et al., Adv. Mater., 29, 17 (2017)[3] Winkler et al., J. Appl. Phys., 125, 21 (2019)[4] Kuhness et al., ACS Appl. Mater. Interfaces, 13, 1, 1178 (2021)
AB - While the general interest in nano-plasmonics is still unbroken, there is an increasing trend towards the integration in real applications such as direct nano-emitters or high performance sensors [1]. Aside of novel concepts, versatile fabrication methods are in demand, which provide a high degree of flexibility concerning design and manufacturing possibilities. Although traditional methods, such as e-beam lithography, are very powerful, well established and reliable, they are often limited in their applicability (e.g. flat surfaces). In contrast, additive direct-write manufacturing may overcome such limitations, although techniques for reliable sub-100 nm fabrication are only a few [2]. In that respect, focused electron beam induced deposition (FEBID) is one of the promising candidates, which not only meets resolution requirements, but also allows true 3D nano-printing on a broad range of materials and almost any surface morphology [3]. As FEBID materials notoriously suffer from high carbon contents, chemical post-growth transfer into pure materials is indispensably needed, which can severely harm or even destroy FEBID-based 3D nano-architectures. Following that challenge, we have dissected FEBID growth characteristics and combined individual advantages via advanced patterning approaches. That allows direct-write fabrication of high-fidelity shapes with nanoscale features in the sub-10 nm range, which allow a shape-stable chemical transfer into plasmonically active Au nano-antennas. Consequently, this contribution ranges from initial 3D-FEBID fabrication over purification towards confirmation of the originally intended plasmonic functionality [4]. The latter is compared to theoretical modelling, which reveals very good agreement and underlines the reliability of 3D-FEBID as generic approach towards more complex 3D nano-concepts for future applications. [1] Plank et al., Micromachines, 11, 1 (2020)[2] Hirt et al., Adv. Mater., 29, 17 (2017)[3] Winkler et al., J. Appl. Phys., 125, 21 (2019)[4] Kuhness et al., ACS Appl. Mater. Interfaces, 13, 1, 1178 (2021)
KW - Focused electron beam-induced deposition (FEBID)
M3 - Poster
T2 - 2021 European Congress and Exhibition on Advanced Materials and Processes
Y2 - 13 September 2021 through 17 September 2021
ER -