A new electron‐beam pumped XeF laser at 486 nm

Wolfgang Ernst; F. K. Tittel

doi:10.1063/1.90909

A new electron‐beam pumped XeF laser at 486 nm

Publikation: Beitrag in einer Fachzeitschrift › Artikel › Begutachtung

Abstract

Laser emission has been observed from XeF on the C (3/2) →A (3/2) transition at 486 nm with a spectral bandwidth of 12 nm. A peak laser power of 5 kW was obtained from Ar/Xe/NF3 mixtures in the ratio of 600: 2: 1 at total pressures of 350-800 kPa excited by 1-MeV 20-kA electron-beam pulses of 8-ns duration. Lasing can also occur on the usual B (1/2) →X (1/2) transition at 353 nm with an appropriate set of cavity reflectors under the same operating conditions.

Originalsprache	englisch
Seiten (von - bis)	36-37
Fachzeitschrift	Applied Physics Letters
Jahrgang	35
Ausgabenummer	1
DOIs	https://doi.org/10.1063/1.90909
Publikationsstatus	Veröffentlicht - 1979
Extern publiziert	Ja

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10.1063/1.90909

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title = "A new electron‐beam pumped XeF laser at 486 nm",

abstract = "Laser emission has been observed from XeF on the C (3/2) →A (3/2) transition at 486 nm with a spectral bandwidth of 12 nm. A peak laser power of 5 kW was obtained from Ar/Xe/NF3 mixtures in the ratio of 600: 2: 1 at total pressures of 350-800 kPa excited by 1-MeV 20-kA electron-beam pulses of 8-ns duration. Lasing can also occur on the usual B (1/2) →X (1/2) transition at 353 nm with an appropriate set of cavity reflectors under the same operating conditions.",

author = "Wolfgang Ernst and Tittel, {F. K.}",

year = "1979",

doi = "10.1063/1.90909",

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AB - Laser emission has been observed from XeF on the C (3/2) →A (3/2) transition at 486 nm with a spectral bandwidth of 12 nm. A peak laser power of 5 kW was obtained from Ar/Xe/NF3 mixtures in the ratio of 600: 2: 1 at total pressures of 350-800 kPa excited by 1-MeV 20-kA electron-beam pulses of 8-ns duration. Lasing can also occur on the usual B (1/2) →X (1/2) transition at 353 nm with an appropriate set of cavity reflectors under the same operating conditions.

U2 - 10.1063/1.90909

DO - 10.1063/1.90909

M3 - Article

SN - 1077-3118

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JO - Applied Physics Letters

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A new electron‐beam pumped XeF laser at 486 nm

Abstract

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