TY - JOUR
T1 - 25th Anniversary Article
T2 - CVD polymers: A new paradigm for surface modification and device fabrication
AU - Coclite, Anna Maria
AU - Howden, Rachel M.
AU - Borrelli, David C.
AU - Petruczok, Christy D.
AU - Yang, Rong
AU - Yagüe, Jose Luis
AU - Ugur, Asli
AU - Chen, Nan
AU - Lee, Sunghwan
AU - Jo, Won Jun
AU - Liu, Andong
AU - Wang, Xiaoxue
AU - Gleason, Karen K.
PY - 2013
Y1 - 2013
N2 - Well-adhered, conformal, thin (<100 nm) coatings can easily be obtained by chemical vapor deposition (CVD) for a variety of technological applications. Room temperature modification with functional polymers can be achieved on virtually any substrate: organic, inorganic, rigid, flexible, planar, three-dimensional, dense, or porous. In CVD polymerization, the monomer(s) are delivered to the surface through the vapor phase and then undergo simultaneous polymerization and thin film formation. By eliminating the need to dissolve macromolecules, CVD enables insoluble polymers to be coated and prevents solvent damage to the substrate. CVD film growth proceeds from the substrate up, allowing for interfacial engineering, real-time monitoring, and thickness control. Initiated-CVD shows successful results in terms of rationally designed micro- and nanoengineered materials to control molecular interactions at material surfaces. The success of oxidative-CVD is mainly demonstrated for the deposition of organic conducting and semiconducting polymers. The deposition of functional polymers from the vapor phase enables new frontiers for device fabrication and technological development. Chemical vapor deposition (CVD) methods have a marked footprint in a wide range of applications from biotechnology to conducting polymers for solar cells. Finally, CVD process implementation to an industrial scale and commercialization are also discussed.
AB - Well-adhered, conformal, thin (<100 nm) coatings can easily be obtained by chemical vapor deposition (CVD) for a variety of technological applications. Room temperature modification with functional polymers can be achieved on virtually any substrate: organic, inorganic, rigid, flexible, planar, three-dimensional, dense, or porous. In CVD polymerization, the monomer(s) are delivered to the surface through the vapor phase and then undergo simultaneous polymerization and thin film formation. By eliminating the need to dissolve macromolecules, CVD enables insoluble polymers to be coated and prevents solvent damage to the substrate. CVD film growth proceeds from the substrate up, allowing for interfacial engineering, real-time monitoring, and thickness control. Initiated-CVD shows successful results in terms of rationally designed micro- and nanoengineered materials to control molecular interactions at material surfaces. The success of oxidative-CVD is mainly demonstrated for the deposition of organic conducting and semiconducting polymers. The deposition of functional polymers from the vapor phase enables new frontiers for device fabrication and technological development. Chemical vapor deposition (CVD) methods have a marked footprint in a wide range of applications from biotechnology to conducting polymers for solar cells. Finally, CVD process implementation to an industrial scale and commercialization are also discussed.
KW - chemical vapor deposition
KW - conformality
KW - conjugated polymers
KW - functional polymers
KW - surface modification
UR - http://www.scopus.com/inward/record.url?scp=84885711371&partnerID=8YFLogxK
U2 - 10.1002/adma.201301878
DO - 10.1002/adma.201301878
M3 - Review article
SN - 0935-9648
VL - 25
SP - 5392
EP - 5423
JO - Advanced Materials
JF - Advanced Materials
IS - 38
ER -